Patterning metal contacts on monolayer MoS2 with vanishing Schottky barriers using thermal nanolithography
NYU Tandon faculty Elisa Riedo (professor of chemical and biomolecular engineering) and Davood Shahrjerdi (assistant professor of electrical computer engineering) contributed to a research paper called “Patterning metal contacts on monolayer MoS2 with vanishing Schottky barriers using thermal nanolithography”, which was subsequently published in Nature [international journal of science].
The research states that two-dimensional semiconductors, such as molybdenum disulfide (MoS2), exhibit a variety of properties that could be useful in the development of novel electronic devices. However, nanopatterning metal electrodes on such atomic layers, which is typically achieved using electron beam lithography, is currently problematic, leading to non-ohmic contacts and high Schottky barriers. The findings show that thermal scanning probe lithography can be used to pattern metal electrodes with high reproducibility, sub-10-nm resolution, and high throughput (105 μm2 h−1 per single probe).
