An Overview of Plasma and Ion Beam Processing Technologies For Precision Materials Modification
Joint Seminar: Department of Applied Physics & Department of Mechanical and Aerospace Engineering
4/28 (Tuesday) Noon – 1:00 pm RH202
An Overview of Plasma and Ion Beam Processing Technologies
For Precision Materials Modification
Dr. Peter Kurunczi
Member, Technical Staff
Applied Materials, Varian Semiconductor
Plasma and ion beam processing technologies have enabled advances in a wide range of industries and disciplines. Examples of the various tools and their applications will be discussed in various fields such as;
- Nano-fabrication of semiconductor devices
- Flat panel displays
- Optical and tribological coatings
This talk will also include a basic explanation of the science and technology for the general audience with the main goal of broadening your options in your own material, surface, and device related research.
Dr. Peter Kurunczi has been working as a scientist at Applied Materials’ Varian Semiconductor division for the past 10 years. During this time he has developed plasma sources for applications in ion beam implantation and processing, etching, charged particle optics and metrology. Prior to joining Applied Materials, he was a Postdoctoral Fellow at the University of Houston under Prof. Vincent Donnelly conducting research in plasma spectroscopy and surface interactions. Dr Peter Kurunczi received his PhD in physics from Stevens Institute of Technology with Prof. Kurt Becker as his advisor. Dr Kurunczi has numerous patents and peer reviewed journal publications.